Three-dimensional semiconductor device

ABSTRACT

A three-dimensional semiconductor device is provided as follows. A substrate includes a contact region, a dummy region, and a cell array region. A stack structure includes electrodes vertically stacked on the substrate. The electrodes are stacked to have a first stepwise structure on the contact region and a second stepwise structure in the dummy region. Ends of at least two adjacent electrodes in the second stepwise structure have first sidewalls vertically aligned so that horizontal positions of the first sidewalls are substantially the same.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.16/804,810 filed on Feb. 28, 2020, which is continuation of U.S. patentapplication Ser. No. 16/685,394 filed on Nov. 15, 2019, which is acontinuation of U.S. patent application Ser. No. 16/178,860 filed onNov. 2, 2018, now U.S. Pat. No. 10,483,323 issued on Nov. 19, 2019,which is a continuation of U.S. patent application Ser. No. 15/067,833filed on Mar. 11, 2016, now U.S. Pat. No. 10,141,372 issued on Nov. 27,2018, which claims priority under 35 U.S.C. § 119 to Korean PatentApplication No. 10-2015-0045728, filed on Mar. 31, 2015, in the KoreanIntellectual Property Office, the disclosures of which are incorporatedby reference herein in their entireties.

TECHNICAL FIELD

An exemplary embodiment of the inventive concept relate to asemiconductor device, and in particular, to a highly integratedthree-dimensional semiconductor device.

DISCUSSION OF RELATED ARTS

Consumers demand semiconductor devices highly integrated at lower costs.Three-dimensional (3D) semiconductor devices includingthree-dimensionally-arranged memory cells have been proposed to satisfythose consumer demands.

SUMMARY

According to an exemplary embodiment of the present inventive concept, athree-dimensional semiconductor device is provided as follows. Asubstrate includes a contact region, a dummy region, and a cell arrayregion. A stack structure includes electrodes vertically stacked on thesubstrate. The electrodes are stacked to have a first stepwise structureon the contact region and a second stepwise structure in the dummyregion. Ends of at least two adjacent electrodes in the second stepwisestructure have first sidewalls vertically aligned so that horizontalpositions of the first sidewalls are substantially the same.

According to an exemplary embodiment of the present inventive concept, athree-dimensional semiconductor device is provided as follows. Asubstrate includes first and second contact regions opposite to eachother in a first direction, first and second dummy regions opposite toeach other in a second direction substantially perpendicular to thefirst direction, and a cell array region disposed between the first andsecond contact regions and between the first and second dummy regions. Astack structure includes electrodes vertically stacked on the substrate.A horizontal length, measured along the first direction, of the firstcontact region is greater than a horizontal length, measured along thesecond direction, of the first dummy region.

According to an exemplary embodiment of the present inventive concept, athree-dimensional semiconductor device is provided as follows. Asubstrate includes a cell array region and first to fourth regionssurrounding the cell array region. A stack structure includes electrodesvertically stacked on the cell array region and the first to fourthregions. At least two adjacent regions of the first to fourth regionshave different widths from each other.

According to an exemplary embodiment of the present inventive concept, asemiconductor device is provided as follows. Electrodes and insulatinglayers are disposed on a substrate, each electrode and each insulatinglayer being alternately stacked so that the electrodes and theinsulating layers are stacked in a pyramid-shaped structure. Each sidesurface of the pyramid-shaped structure has a stepped surface sloped ina predetermined angle with respect to a top surface of the substrate.Vertical structures are disposed within an uppermost electrode andpenetrates the electrodes and the insulating layers to be in contactwith the substrate. Contact plugs are disposed on a first side surfaceof the pyramid-shaped structure. The first side surface has the largestpredetermined angle and each contact plug is connected to acorresponding portion of the electrodes within the first side surface.

BRIEF DESCRIPTION OF DRAWINGS

These and other features of the inventive concept will become moreapparent by describing in detail exemplary embodiments thereof withreference to the accompanying drawings of which:

FIG. 1 is a layout of a three-dimensional semiconductor memory deviceaccording to an exemplary embodiment of the inventive concept;

FIG. 2 is a block diagram illustrating a three-dimensional semiconductormemory device according to an exemplary embodiment of the inventiveconcept;

FIG. 3 is a circuit diagram illustrating a memory cell array of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept;

FIG. 4 is a perspective view illustrating a memory cell array of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept;

FIG. 5A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept;

FIG. 5B is an enlarged perspective view illustrating a portion ‘A’ ofFIG. 5A;

FIG. 6A is a sectional view, taken along line I-I′, of thethree-dimensional semiconductor memory device of FIG. 5A;

FIG. 6B is an enlarged sectional view illustrating a portion ‘A’ of FIG.6A;

FIG. 7 is a sectional view, taken along line II-II′, of thethree-dimensional semiconductor memory device of FIG. 5A;

FIG. 8 is a sectional view, taken along line III-III′, of thethree-dimensional semiconductor memory device of FIG. 5A;

FIG. 9A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to other anexemplary embodiment of the inventive concept;

FIG. 9B is an enlarged perspective view illustrating a portion ‘A’ ofFIG. 9A;

FIG. 10 is a sectional view, taken along line I-I′, of thethree-dimensional semiconductor memory device of FIG. 9A;

FIG. 11 is a sectional view, taken along line II-II′, of thethree-dimensional semiconductor memory device of FIG. 9A;

FIG. 12 is a sectional view, taken along line III-III′, of thethree-dimensional semiconductor memory device of FIG. 9A;

FIG. 13A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to still otheran exemplary embodiment of the inventive concept;

FIG. 13B is an enlarged perspective view illustrating a portion ‘A’ ofFIG. 13A;

FIG. 14 is a sectional view, taken along line I-I′, of thethree-dimensional semiconductor memory device of FIG. 13A;

FIG. 15 is a sectional view, taken along line II-II′, of thethree-dimensional semiconductor memory device of FIG. 13A;

FIG. 16 is a sectional view, taken along line III-III′, of thethree-dimensional semiconductor memory device of FIG. 13A;

FIGS. 17 through 24 are sectional views illustrating a method offabricating a three-dimensional semiconductor device, according to anexemplary embodiment of the inventive concept.

Although corresponding plan views and/or perspective views of somecross-sectional view(s) may not be shown, the cross-sectional view(s) ofdevice structures illustrated herein provide support for a plurality ofdevice structures that extend along two different directions as would beillustrated in a plan view, and/or in three different directions aswould be illustrated in a perspective view. The two different directionsmay or may not be orthogonal to each other. The three differentdirections may include a third direction that may be orthogonal to thetwo different directions. The plurality of device structures may beintegrated in a same electronic device. For example, when a devicestructure (e.g., a memory cell structure or a transistor structure) isillustrated in a cross-sectional view, an electronic device may includea plurality of the device structures (e.g., memory cell structures ortransistor structures), as would be illustrated by a plan view of theelectronic device. The plurality of device structures may be arranged inan array and/or in a two-dimensional pattern.

DETAILED DESCRIPTIONS OF EXEMPLARY EMBODIMENTS

Exemplary embodiments of the inventive concept will be described belowin detail with reference to the accompanying drawings. However, theinventive concept may be embodied in different forms and should not beconstrued as limited to the embodiments set forth herein. In thedrawings, the thickness of layers and regions may be exaggerated forclarity. It will also be understood that when an element is referred toas being “on” another element or substrate, it may be directly on theother element or substrate, or intervening layers may also be present.It will also be understood that when an element is referred to as being“coupled to” or “connected to” another element, it may be directlycoupled to or connected to the other element, or intervening elementsmay also be present. Like reference numerals may refer to the likeelements throughout the specification and drawings.

An exemplary embodiment of the inventive concepts are described hereinwith reference to cross-sectional illustrations that are schematicillustrations of idealized embodiments (and intermediate structures) ofan exemplary embodiment. As such, variations from the shapes of theillustrations as a result, for example, of manufacturing techniquesand/or tolerances, are to be expected. Thus, an exemplary embodiment ofthe inventive concepts should not be construed as limited to theparticular shapes of regions illustrated herein but are to includedeviations in shapes that result, for example, from manufacturing. Forexample, an implanted region illustrated as a rectangle may have roundedor curved features and/or a gradient of implant concentration at itsedges rather than a binary change from implanted to non-implantedregion. Likewise, a buried region formed by implantation may result insome implantation in the region between the buried region and thesurface through which the implantation takes place. Thus, the regionsillustrated in the figures are schematic in nature and their shapes arenot intended to illustrate the actual shape of a region of a device andare not intended to limit the scope of an exemplary embodiment.

As appreciated by the present inventive entity, devices and methods offorming devices according to various embodiments described herein may beembodied in microelectronic devices such as integrated circuits, whereina plurality of devices according to various embodiments described hereinare integrated in the same microelectronic device. Accordingly, thecross-sectional view(s) illustrated herein may be replicated in twodifferent directions, which need not be orthogonal, in themicroelectronic device. Thus, a plan view of the microelectronic devicethat embodies devices according to various embodiments described hereinmay include a plurality of the devices in an array and/or in atwo-dimensional pattern that is based on the functionality of themicroelectronic device.

Accordingly, the cross-sectional view(s) illustrated herein providesupport for a plurality of devices according to various embodimentsdescribed herein that extend along two different directions in a planview and/or in three different directions in a perspective view. Forexample, when a single active region is illustrated in a cross-sectionalview of a device/structure, the device/structure may include a pluralityof active regions and transistor structures (or memory cell structures,gate structures, etc., as appropriate to the case) thereon, as would beillustrated by a plan view of the device/structure.

In an embodiment of the present inventive concept, a three dimensional(3D) memory array is provided. The 3D memory array is monolithicallyformed in one or more physical levels of arrays of memory cells havingan active area disposed above a silicon substrate and circuitryassociated with the operation of those memory cells, whether suchassociated circuitry is above or within such substrate. The term“monolithic” means that layers of each level of the array are directlydeposited on the layers of each underlying level of the array. In anembodiment of the present inventive concept, the 3D memory arrayincludes vertical NAND strings that are vertically oriented such that atleast one memory cell is located over another memory cell. The at leastone memory cell may comprise a charge trap layer. The following patentdocuments, which are hereby incorporated by reference, describe suitableconfigurations for three dimensional memory arrays, in which thethree-dimensional memory array is configured as a plurality of levels,with word lines and/or bit lines shared between levels: U.S. Pat. Nos.7,679,133; 8,553,466; 8,654,587; 8,559,235; and US Pat. Pub. No.2011/0233648.

FIG. 1 is a layout of a three-dimensional semiconductor memory deviceaccording to an exemplary embodiment of the inventive concept. FIG. 2 isa block diagram illustrating a three-dimensional semiconductor memorydevice according to an exemplary embodiment of the inventive concept.

Referring to FIG. 1, a three-dimensional semiconductor memory device mayinclude a cell array region CAR and a peripheral circuit region. Theperipheral circuit region may include at least one row decoder regionROW DCR, at least one page buffer region PBR, and at least one columndecoder region COL DCR. Furthermore, a contact region CTR may beprovided between the cell array region CAR and each row decoder regionROW DCR.

Referring to FIGS. 1 and 2, a memory cell array 1 including a pluralityof memory cells may be provided on the cell array region CAR. The memorycell array 1 may further include word and bit lines electricallyconnected to the memory cells, in addition to the memory cells. In anexemplary embodiment, the memory cell array 1 may include a plurality ofmemory blocks BLK0-BLKn, each of which is configured to independentlyperform an erase operation. The memory cell array 1 will be described inmore detail with reference to FIGS. 3 and 4.

In each row decoder region ROW DCR, a row decoder 2 may be provided toallow for selection of the word lines in the memory cell array 1. Ineach contact region CTR, an interconnection structure may be provided toconnect the memory cell array 1 to the row decoder 2. The row decoder 2may be configured to select a specific memory block from the memoryblocks BLK0-BLKn of the memory cell array 1 and moreover a specific wordline from the word lines of the selected memory block, depending onaddress information to be input. In addition, the row decoder 2 may beconfigured to provide word-line voltages, which are generated in avoltage generator (not shown), adaptively to the selected word line andun-selected word lines, in response to control signals from a controlcircuit (not shown).

In each page buffer region PBR, at least one page buffer 3 may beprovided to read out data stored in the memory cells. Depending on anoperation mode, each page buffer 3 may execute a process of temporarilystoring data to be stored in the memory cells or of reading out datastored in the memory cells. For example, the page buffer 3 may functionas a write driver in a program operation mode or as a sense amplifier ina read operation mode.

A column decoder 4 connected to the bit lines of the memory cell array 1may be provided in each column decoder region COL DCR. The columndecoder 4 may be configured to provide data-transmission paths betweenthe page buffer 3 and an external device (e.g., a memory controller).

FIG. 3 is a schematic circuit diagram illustrating a memory cell army ofa three-dimensional semiconductor memory device according to anexemplary embodiment of the inventive concept.

Referring to FIG. 3, a three-dimensional semiconductor memory device mayinclude a memory cell array, in which a common source line CSL, aplurality of bit lines BL, and a plurality of cell strings CSTR areprovided.

The bit lines BL may be two-dimensionally arranged and a plurality ofcell strings CSTR may be connected in parallel to each of the bit linesBL. The cell strings CSTR may be connected in common to the commonsource line CSL. For example, the plurality of cell strings CSTR may beprovided between the plurality of bit lines BL and the common sourceline CSL. In an exemplary embodiment, a plurality of common source linesCSL may be two-dimensionally arranged on the substrate. In an exemplaryembodiment, the common source lines CSL may be applied with the samevoltage. In an exemplary embodiment, the common source lines CSL may beseparated from each other and may be independently controlled.

Each of the cell strings CSTR may include a ground selection transistorGST connected to the common source line CSL, a string selectiontransistor SST connected to one of the bit lines BL, and a plurality ofmemory cell transistors MCT provided between the ground and stringselection transistors GST and SST. In addition, the memory celltransistors MCT may be connected in series to the ground selectiontransistor GST and the string selection transistor SST.

The common source line CSL may be connected in common to sources of theground selection transistors GST of the cell strings CSTR. In addition,at least one ground selection line GSL, a plurality of word lines WL0 toWL3, and a plurality of string selection lines SSL may be disposedbetween the common source line CSL and the bit lines BL to serve as gateelectrodes of the ground selection transistor GST, the memory celltransistors MCT, and the string selection transistors SST, respectively.Each of the memory cell transistors MCT may include a data storageelement.

FIG. 4 is a perspective view illustrating a memory cell array of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept.

Referring to FIG. 4, the common source line CSL may be a conductivelayer disposed on a substrate 100 or an impurity region 145 formed inthe substrate 100. The bit lines BL may be conductive patterns (e.g.,metal lines) that are vertically spaced apart from the substrate 100.The bit lines BL may be two-dimensionally arranged and a plurality ofcell strings CSTR may be connected in parallel to each of the bit linesBL. Accordingly, the cell strings CSTR may be two-dimensionally arrangedon the common source line CSL or the substrate 100.

Each of the cell strings CSTR may include a plurality of groundselection lines GSL1 and GSL2, a plurality of word lines WL0-WL3, and aplurality of string selection lines SSL1 and SSL2, which are disposedbetween the common source line CSL and the bit lines BL. In an exemplaryembodiment, the string selection lines SSL1 and SSL2 may serve as thestring selection line SSL of FIG. 3, and the ground selection lines GSL1and GSL2 may serve as the ground selection line GSL of FIG. 3. Theground selection lines GSL1 and GSL2, the word lines WL0-WL3, and thestring selection lines SSL1 and SSL2 may be conductive patterns (i.e.,gate electrodes) that are stacked on each other from the substrate 100.

In addition, each of the cell strings CSTR may include a verticalstructure VS vertically extending from the common source line CSL, andthe vertical structure VS may be connected to the bit line BL. Thevertical structure VS may be formed to penetrate the ground selectionlines GSL1 and GSL2, the word lines WL0-WL3, and the string selectionlines SSL1 and SSL2. For example, the vertical structures VS maypenetrate a plurality of conductive patterns stacked on the substrate100.

In an exemplary embodiment, the vertical structure VS may be formed ofor include a semiconductor material and may include a firstsemiconductor pattern SP1, which is connected to the substrate 100, anda second semiconductor pattern SP2, which is interposed between thefirst semiconductor pattern SP1 and a data storing layer DS.Furthermore, the vertical structures VS may include impurity regions D.The drain region D may be formed in a top portion of the verticalstructure VS.

The data storing layer DS may be disposed between the word lines WL0-WL3and the vertical structures VS. In an exemplary embodiment, the datastoring layer DS may be a charge storing layer. For example, the datastoring layer DS may be or include at least one of a trap insulatinglayer, a floating gate electrode, and an insulating layer withconductive nano-dots. Data stored in the data storing layer DS may bechanged using a Fowler-Nordheim FN tunneling effect, which may be causedby a voltage difference between the vertical structure VS and the wordlines WL0-WL3. In an exemplary embodiment, the data storing layer DS mayinclude a phase-changeable or variable resistance property layer, whichis configured to store data therein, for example.

In an exemplary embodiment, the data storing layer DS may include avertical pattern VP, which is provided to penetrate the word linesWL0-WL3, and a horizontal pattern HP, which is disposed between the wordlines WL0-WL3 and the vertical pattern VP to cover top and bottomsurfaces of the word lines WL0-WL3.

A dielectric layer serving as a gate insulating layer of a transistormay be provided between the ground selection lines GSL1 and GSL2 and thevertical structures VS or between the string selection lines SSL1 andSSL2 and the vertical structure VS. Here, the dielectric layer may beformed of the same material as the data storing layer DS and, in anexemplary embodiment, it may be formed of the same material (e.g.,silicon oxide) as a gate insulating layer of a metal-oxide-semiconductorfield-effect transistor (MOSFET).

In this structure, the vertical structures VS, in conjunction with theground selection lines GSL1 and GSL2, the word lines WL0-WL3, and thestring selection lines SSL1 and SSL2, may constitute ametal-oxide-semiconductor field effect transistor (MOSFET) using thevertical structure VS as a channel region.

In this case, the ground selection lines GSL1 and GSL2, the word linesWL0-WL3, and the string selection lines SSL1 and SSL2 may serve as gateelectrodes of the selection transistors and the cell transistors. Inthis case, according to voltages applied to the word lines WL0-WL3 andthe selection lines SSL1, SSL2, GSL1, and GSL2, inversion regions may beformed in the vertical structures VS, by fringe field produced near theword lines WL0-WL3 and the selection lines SSL1, SSL2, GSL1, and GSL2.Here, the word lines WL0-WL3 or the selection lines SSL1, SSL2, GSL1,and GSL2 may be formed to have a smaller thickness than a maximum lengthor width of the inversion region. Accordingly, in each of the verticalstructures VS, the inversion regions may be vertically overlapped witheach other to form a current path electrically connecting the commonsource line CSL and a selected one of the bit lines BL. For example, theground and string selection transistors controlled by the ground andstring selection lines GSL1, GSL2, SSL1, and SSL2 and the celltransistors MCT controlled by the word lines WL0-WL3 may be connected inseries, in the cell string CSTR.

In an exemplary embodiment, the vertical structures VS, in conjunctionwith the ground selection lines GSL1 and GSL2, the word lines WL0-WL3,and the string selection lines SSL1 and SSL2, may constitute ametal-oxide-semiconductor (MOS) capacitor.

FIG. 5A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept, and FIG. 5B is an enlargedperspective view illustrating a portion ‘A’ of FIG. 5A. FIG. 6A is asectional view, taken along line I-I′, of the three-dimensionalsemiconductor memory device of FIG. 5A, and FIG. 6B is an enlargedsectional view illustrating a portion ‘A’ of FIG. 6A. FIG. 7 is asectional view, taken along line II-II′, of the three-dimensionalsemiconductor memory device of FIG. 5A, and FIG. 8 is a sectional view,taken along line III-III′, of the three-dimensional semiconductor memorydevice of FIG. 5A.

Referring to FIGS. 5A, 5B, 6A, 6B, 7, and 8, the substrate 100 mayinclude the cell array region CAR, first and second contact regions CTR1and CTR2, which are positioned at both sides of the cell array regionCAR in a first direction D1, and first and second dummy regions DMR1 andDMR2, which are positioned at both sides of the cell array region CAR ina second direction D2 perpendicular to the first direction D1.

A cell array structure including stack structures ST and verticalstructures VS, common source regions 145, common source structures,interconnection structures, and bit lines BL may be provided on thesubstrate 100.

Each of the stack structures ST may include electrodes EL and insulatinglayers ILD, which are alternatingly and sequentially stacked on thesubstrate 100. The electrodes EL of the stack structures ST may includea conductive material—for example, the electrodes EL may include dopedsemiconductor (e.g., doped silicon), metals (e.g., tungsten, copper,aluminum, and so forth), conductive metal nitrides (e.g., titaniumnitride, tantalum nitride, and so forth), or transition metals (e.g.,titanium, tantalum, and so forth). In the stack structures ST, theinsulating layers ILD may include at least one insulating layer thinnerthan the other insulating layers. For example, the lowermost one of theinsulating layers ILD may be thinner than the others. In an exemplaryembodiment, at least one of the insulating layers ILD may be formedthicker than the others. The insulating layers ILD may be formed of orinclude silicon oxide.

The stack structures ST may be formed to have a stepwise structure on atleast one of the first and second contact regions CTR1 and CTR2 toelectrically connect the electrodes EL to peripheral circuits. Theelectrodes EL will be described in more detail below.

The insulating gapfill layer 117 may be formed on the substrate 100 tocover the stack structures ST. The capping insulating layer 175 maycover a plurality of stack structures ST and the insulating gapfilllayer 117. The bit lines BL may be disposed on the capping insulatinglayer 175 to cross the stack structures ST and extend in the seconddirection D2. The bit lines BL may be electrically connected to thevertical structures VS via bit line contact plugs BPLG.

The vertical structures VS may be provided to penetrate the stackstructures ST and may be electrically connected to the substrate 100. Inan exemplary embodiment, the vertical structures VS may be disposed toform a zigzag arrangement, when viewed in a plan view or when viewedfrom the above the device. In an exemplary embodiment, the verticalstructures VS may be disposed to form a linear arrangement, when viewedin a plan view.

In an exemplary embodiment, the vertical structures VS may include asemiconductor material. For example, as shown in FIG. 6B, the verticalstructure VS may include the first semiconductor pattern SP1, which isconnected to the substrate 100, and the second semiconductor patternSP2, which is interposed between the first semiconductor pattern SP1 andthe data storing layer DS. The first semiconductor pattern SP1 may beshaped like a hollow pipe (or macaroni) having one closed end. In anexemplary embodiment, the first semiconductor pattern SP1 may be shapedlike a circular pillar. In an exemplary embodiment, the firstsemiconductor pattern SP1 may be shaped liked a hollow pipe or macaroni.The first semiconductor pattern SP1 may have a closed bottom, and aninner space of the first semiconductor pattern SP1 may be filled with aninsulating material.

The data storing layer DS may be disposed between the stack structuresST and the vertical structures VS. The data storing layer DS may includethe vertical pattern VP, which is provided to penetrate the stackstructures ST, and the horizontal pattern HP, which is provided betweenthe electrodes EL and the vertical patterns VP and is extended to covertop and bottom surfaces of the electrodes EL.

The interconnection structure may be provided on at least one of thefirst and second contact regions CTR1 and CTR2 to electrically connectthe cell array structure to the peripheral circuits. In an exemplaryembodiment, the interconnection structure may include contact plugs PLG,which are provided on at least one of the first or second contactregions CTR1 and CTR2 and are respectively connected to end portions ofthe electrodes EL through the insulating gapfill layer 117, andconnection lines CL, which are provided on the insulating gapfill layer117 and are connected to the contact plugs PLG through contact patternsCT. A vertical length of the contact plugs PLG may increase in adirection toward the substrate 100. The contact plugs PLG may have topsurfaces that are substantially coplanar with those of the verticalstructures VS.

The common source regions 145 may be formed in the substrate 100 andbetween the stack structures ST. The common source regions 145 mayextend parallel to the first direction D1. The stack structures ST andthe common source regions 145 may be alternatingly and repeatedlyarranged in the second direction D2.

Each of the common source structures may be provided between the stackstructures ST and may be electrically connected to a corresponding oneof the common source regions 145. The common source structure mayinclude an insulating sidewall spacer SP covering sidewalls of the stackstructures ST and a common source plug CSPLG, which is connected to thecommon source region 145. In read and program operations of thethree-dimensional semiconductor memory device, a ground voltage may beapplied to the common source region 145 through the common source plugCSPLG. In an exemplary embodiment, the common source plug CSPLG may havea substantially uniform upper width and may extend parallel to the firstdirection D1. In an exemplary embodiment, a pair of the insulatingsidewall spacers SP facing each other may be provided between anadjacent pair of the stack structures ST. In an exemplary embodiment,the insulating sidewall spacer SP may be provided to fill a gap regionbetween an adjacent pair of the stack structures ST, and the commonsource plug CSPLG may be provided to penetrate the insulating sidewallspacer SP and be in partial contact with the common source region 145.The insulating sidewall spacer SP may be formed of or include siliconoxide, silicon nitride, silicon oxynitride, or low-k dielectricmaterials. The common source plug CSPLG may include metals (e.g.,tungsten, copper or aluminum), conductive metal nitrides (e.g., titaniumnitride, or tantalum nitride), or transition metals (e.g., titanium ortantalum).

Hereinafter, the electrodes will be described in more detail.

Referring to FIGS. 5A, 5B, 6A, 7, and 8, the electrodes may be providedto cover the cell array region CAR, the first and second contact regionsCTR1 and CTR2, and the first and second dummy regions DMR1 and DMR2.

For the sake of brevity, electrodes provided on the first and secondcontact regions CTR1 and CTR2 will be referred to as ‘first and secondelectrodes EL1 and EL2’ in FIG. 7, respectively, and electrodes providedon the first and second dummy regions DMR1 and DMR2 will be referred toas ‘first and second dummy electrodes DEL1 and DEL2’, respectively, inFIG. 8. Furthermore, although ten electrodes are illustrated in FIGS.5A, 5B, 6A, 7, and 8, the number of the electrodes may be variouslychanged.

Each of the first electrodes EL1 may have first ends of which horizontalpositions are different from each other. The lower the first electrodeEL1 is positioned in a stepwise structure of the first electrodes EL1,the farther the first end of the first electrode EL1 is positioned froma center of the cell array region CAR. For example, the horizontallength of the first electrode EL1 may increase in a stepwise manner withdecreasing distance from the substrate 100. For example, the firstelectrodes EL1 may be stacked to form a stepwise structure with tensteps. The first ends of the first electrodes EL1 may be be positionedin a first slope SLP1 in the first contact region CRT1 with respect tothe top surface of the substrate 100.

The first contact region CTR1 may be provided to have a first width WT1.The first width WT1 of the first contact region CTR1 may besubstantially equal to the longest of horizontal lengths of the firstelectrodes EL1, when measured in the first direction D1.

The second electrodes EL2 may have second ends of which horizontalpositions are different from each other. The lower the second electrodeEL2 may be positioned in a stepwise structure of the second electrodesEL2, the farther the second end of the second electrode EL2 ispositioned from the center of the cell array region CAR. For example,the horizontal length of the second electrode EL2 may increase in astepwise manner with decreasing distance from the substrate 100. Forexample, the second electrodes EL2 may be stacked to form a stepwisestructure with ten steps. The second ends of the second electrodes EL2may be positioned in a second slope SLP2 in the second contact regionCFR2 with respect to the top surface of the substrate 100.

The second contact region CTR2 may be provided to have a second widthWT2. The second width WT2 of the second contact region CTR2 may besubstantially equal to the longest of horizontal lengths of the secondelectrodes EL2, when measured in the first direction D1. In an exemplaryembodiment, the first width WT1 of the first contact region CTR1 may besubstantially equal to the second width WT2 of the second contact regionCTR2.

In an exemplary embodiment, the first and second electrodes EL1 and EL2positioned at the same level may have substantially the same horizontallength. For example, the lowermost one of the first electrodes EL1 andthe lowermost one of the second electrodes EL2, in a vertical direction,may have substantially the same horizontal length (e.g., a firstlength). As shown in FIGS. 6A, 7, and 8, a corresponding pair of thefirst and second electrodes EL1 and EL2 may be symmetrically disposedwith respect to the cell array region CAR. In this case, the first andsecond slopes SLP1 and SLP2 may be substantially the same.

The first dummy electrodes DEL1 may have third ends, respectively. Atleast two of the third ends may have the same horizontal position. Thefirst dummy electrodes DEL1 whose third ends have the same horizontalposition, may be disposed adjacent to each other. For example, thelowermost first dummy electrode and the adjacent first dummy electrodemay have third ends having the same horizontal position. The lower thefirst dummy electrode DEL1 is positioned in a stepwise structure of thefirst dummy electrodes DEL1, the farther the third end of the firstdummy electrode DEL1 is positioned from the center of the cell arrayregion CAR. The third ends of the first dummy electrodes may bepositioned in a third slope SLP3 in the first dummy region DMR1 withrespect to the top surface of the substrate 100. The third slope SLP3may be greater than the first slope SLP1.

For example, as shown in FIGS. 5A and 8, in the stack structure of thefirst dummy electrodes DEL1, ones at first and second levels may havevertically-aligned ends, and ones at third and fourth levels may havevertically-aligned ends and may have a horizontal length shorter thanthe ones at the first and second levels. The first dummy electrodes DEL1may be stacked to form a stepwise structure with five steps. Forexample, two adjacent first dummy electrodes DEL1 may form one step ofthe stepwise structure. In the case of the five steps, the stepwisestructure may include ten (10) first dummy electrodes DEL1 stacked oneach other.

The second dummy electrodes DEL2 may have fourth ends, respectively. Atleast two of the fourth ends may have the same horizontal position. Thesecond dummy electrodes DEL2 of which fourth ends have the samehorizontal position, may be disposed adjacent to each other. The lowerthe second dummy electrode DEL2 is positioned in a stepwise structure ofthe second dummy electrodes DEL2, the farther the fourth end of thesecond dummy electrode DEL2 is positioned from the center of the cellarray region CAR. The fourth ends of the second dummy electrode DEL2 maybe positioned in a fourth slope SLP4 in the second dummy region DMR2with respect to the top surface of the substrate 100. The fourth slopeSLP4 may be greater than the first slope SLP1.

For example, as shown in FIGS. 5A and 8, in the stack structure of thesecond dummy electrodes DEL2, ones at first and second levels may havevertically-aligned ends, and ones at third and fourth levels may havevertically-aligned ends and may have a horizontal length shorter thanthe ones at the first and second levels. The second dummy electrodesDEL2 may be stacked to form a stepwise structure with five steps. Forexample, two adjacent second dummy electrodes DEL2 may form one step ofthe stepwise structure. In the case of the five steps, the stepwisestructure may include ten (10) second dummy electrodes DEL2 stacked oneach other.

In an exemplary embodiment, the first and second dummy electrodes DEL1and DEL2 positioned at the same level may have substantially the samehorizontal length. For example, the lowermost first dummy electrodesDEL1 and the lowermost second dummy electrodes DEL2, in the verticaldirection, may have substantially the same horizontal length (e.g., afirst length). As shown in FIGS. 6A, 7, and 8, a corresponding pair ofthe first and second dummy electrodes DEL1 and DEL2 may be symmetricallydisposed with respect to the cell array region CAR. In this case, thethird and fourth slopes SLP3 and SLP4 may be substantially the same.

In an exemplary embodiment, the contact plugs PLG of the interconnectionstructure may be respectively connected to the first electrodes EL1 ofthe first contact region CTR1. Although not shown, depending onconfiguration of the interconnection structure, the second electrodesEL2 of the second contact region CTR2 may also be electrically connectedto the interconnection structure. However, at least two of the first andsecond dummy electrodes DEL1 and DEL2 may be stacked in a verticallyaligned manner on the first and second dummy regions DMR1 and DMR2. Theinterconnection structure need not be formed in the first and seconddummy regions DMR1 and DMR2 to reduce the area of the first and seconddummy regions DMR1 and DMR2, and to increase the effective area of thecell array region CAR. In an exemplary embodiment, the effective area ofthe cell array region CAR may increase as the area reduced by the firstand second dummy regions DMR1 and DMR2 according to an exemplaryembodiment.

Referring to FIGS. 5A and 6A, the three-dimensional semiconductor devicemay include a pyramid-shaped structure including the electrodes EL andthe insulating layers ILD. Each electrode EL and each insulating layerILD may be alternately stacked so that the electrodes EL and theinsulating layers ILD are stacked in the pyramid-shaped structure. Eachside surface of the pyramid-shaped structure has a stepped surfacesloped in a predetermined angle with respect to a top surface of thesubstrate 100. Vertical structures VS may be disposed within anuppermost electrode and may penetrate the electrodes EL and theinsulating layers ILD to be in contact with the substrate 100. Thecontact plugs PLG may be disposed on a first side surface of thepyramid-shaped structure having the slope of SLP1. The first sidesurface has the largest predetermined angle and each contact plug PLG isconnected to a corresponding portion of the electrodes EL within thefirst side surface.

FIG. 9A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to other anexemplary embodiment of the inventive concept, and FIG. 9B is anenlarged perspective view illustrating a portion ‘A’ of FIG. 9A. FIGS.10, 11, and 12 are sectional views, taken along lines I-I′, II-II′, andIII-III′, respectively, of the three-dimensional semiconductor memorydevice of FIG. 9A.

Referring to FIGS. 9A, 9B, 10, 11, and 12, a three-dimensionalsemiconductor memory device may include a substrate 100, a cell arraystructure including stack structures ST and vertical structures VS,common source regions 145, common source structures, interconnectionstructures, an insulating gapfill layer, a capping insulating layer, andbit lines BL.

The substrate 100 may include the cell array region CAR, the first andsecond contact regions CTR1 and CTR2 positioned at both sides of thecell array region CAR in a first direction D1, and the first and seconddummy regions DMR1 and DMR2 positioned at both sides of the cell arrayregion CAR in a second direction D2 perpendicular to the first directionD1.

In an exemplary embodiment, the substrate 100, the cell array structure,the common source regions 145, the common source structures, theinterconnection structures, the insulating gapfill layer, the cappinginsulating layer, and the bit lines BL, except for the electrodes of thestack structures ST, may be configured to have substantially the samefeatures as those of the previous embodiments described with referenceto FIGS. 5A, 5B, 6A, 6B, 7, and 8, and thus, such elements will beidentified by a similar or identical reference number without repeatingthe descriptions thereof.

Hereinafter, the structure of the electrodes will be described withreference to FIGS. 9A, 9B, 10, 11, and 12.

The electrodes may include the first electrodes EL1 on the first contactregion CTR1, the second electrodes EL2 on the second contact regionCTR2, the first dummy electrodes DEL1 on the first dummy region DMR1,and the second dummy electrodes DEL2 on the second dummy region DMR2.

The first electrodes EL1 may be stacked to form a stepwise structure.For example, horizontal lengths of the first electrodes EL1 may increasein a stepwise manner with decreasing vertical distance from thesubstrate 100. For example, as shown in FIGS. 9A, 9B, 10, 11, and 12,the first electrodes EL1 may be stacked to form a stepwise structurewith ten steps. The first ends of the first electrodes EL1 may bepositioned in the first slope SLP1 with respect to the top surface ofthe substrate 100. The first contact region CTR1 may be provided to havethe first width WT1.

The second electrodes EL2 may be stacked to form a stepwise structure.For example, horizontal lengths of the second electrodes EL2 mayincrease in a stepwise manner with decreasing vertical distance from thesubstrate 100. For example, as shown in FIGS. 9A, 9B, 10, 11, and 12,the second electrodes EL2 may be stacked to form a stepwise structurewith ten steps. The second ends of the second electrodes EL2 may bepositioned in the second slope SLP2 with respect to the top surface ofthe substrate 100. The second contact region CTR2 may be provided tohave the second width WT2.

In an exemplary embodiment, a corresponding pair of the first and secondelectrodes EL1 and EL2 may be symmetrically disposed with respect to thecell array region CAR. The first and second slopes SLP1 and SLP2 may besubstantially the same. The first and second widths WT1 and WT2 may besubstantially the same.

At least two of the third ends of the first dummy electrodes DEL1 mayhave the same horizontal position. For example, as shown in FIGS. 9A,9B, 10, 11, and 12, the third ends of two first dummy electrodes DEL1which are vertically adjacent to each other may have substantially thesame horizontal position. The first dummy electrodes DEL1 may be stackedto form a stepwise structure with five steps. The third ends of thefirst dummy electrodes DEL1 may be positioned in the third slope SLP3with respect to the top surface of the substrate 100. The first dummyregion DMR1 may be provided to have a third width WT3.

At least two of the fourth ends of the second dummy electrodes DEL2 mayhave the same horizontal position. For example, as shown in FIGS. 9A,9B, 10, 11, and 12, the fourth ends of two second dummy electrodes DEL2which are vertically adjacent to each other may have substantially thesame horizontal position. The second dummy electrodes DEL2 may bestacked to form a stepwise structure with four steps. The fourth ends ofthe second dummy electrodes DEL2 may be positioned in the fourth slopeSLP4 with respect to the top surface of the substrate 100. The seconddummy region DMR2 may be provided to have a fourth width WT4.

In an exemplary embodiment, the first dummy electrodes DEL1 and thesecond dummy electrodes DEL2 may be asymmetrically disposed with respectto the cell array region CAR. For example, the third and fourth slopesSLP3 and SLP4 may be different from each other. For example, the fourthslope SLP4 may be greater than the third slope SLP3, and the third andfourth widths WT3 and WT4 may be different from each other. As anexample, the third width WT3 may be greater than the fourth width WT4.

In an exemplary embodiment, the first slope SLP1 may be smaller than thethird slope SLP3, and the third width WT3 may be smaller than the firstwidth WT1.

In an exemplary embodiment, the contact plugs PLG of the interconnectionstructure may be respectively connected to the first electrodes EL1 ofthe first contact region CTR1. Although not shown, depending onconfiguration of the interconnection structure, the second electrodesEL2 of the second contact region CTR2 may also be electrically connectedto the interconnection structure. At least two of the first and seconddummy electrodes DEL1 and DEL2 may be stacked in a vertically alignedmanner on the first and second dummy regions DMR1 and DMR2. Theinterconnection structure need not be formed in the first and seconddummy regions DMR1 and DMR2 to reduce the area of the first and seconddummy regions DMR1 and DMR2, and to increase the effective area of thecell array region CAR.

FIG. 13A is a plan view illustrating a memory cell region of athree-dimensional semiconductor memory device according to an exemplaryembodiment of the inventive concept, and FIG. 13B is an enlargedperspective view illustrating a portion ‘A’ of FIG. 13A. FIGS. 14, 15,and 16 are sectional views, taken along lines I-I′, II-II′, andIII-III′, respectively, of the three-dimensional semiconductor memorydevice of FIG. 13A.

Referring to FIGS. 13A, 13B, 14, 15, and 16, a three-dimensionalsemiconductor memory device may include a substrate 100, a cell arraystructure including stack structures ST and vertical structures VS,common source regions 145, common source structures, interconnectionstructures, an insulating gapfill layer, a capping insulating layer, andbit lines BL.

The substrate 100 may include the cell array region CAR, the first andsecond contact regions CTR1 and CTR2 positioned at both sides of thecell array region CAR in a first direction D1, and the first and seconddummy regions DMR1 and DMR2 positioned at both sides of the cell arrayregion CAR in a second direction D2 perpendicular to the first directionD1.

In an exemplary embodiment, the substrate 100, the cell array structure,the common source regions 145, the common source structures, theinterconnection structures, the insulating gapfill layer, the cappinginsulating layer, and the bit lines BL, except for the electrodes of thestack structures ST, may be configured to have substantially the samefeatures as those of the previous embodiments described with referenceto FIGS. 5A, 5B, 6A, 6B, 7, and 8, and thus, such elements will beidentified by a similar or identical reference number without repeatingthe descriptions thereof.

Hereinafter, the structure of the electrodes will be described withreference to FIGS. 13A, 13B, 14, 15, and 16.

The electrodes may include the first electrodes EL1 on the first contactregion CTR1, the second electrodes EL2 on the second contact regionCTR2, the first dummy electrodes DEL1 on the first dummy region DMR1,and the second dummy electrodes DEL2 on the second dummy region DMR2.

The first electrodes EL1 may be stacked to form a stepwise structure.For example, horizontal lengths of the first electrodes EL1 may increasein a stepwise manner with decreasing vertical distance from thesubstrate 100. For example, the first electrodes EL1 may be stacked toform a stepwise structure with ten steps. The first ends of the firstelectrodes EL1 may be positioned in the first slope SLP1 with respect tothe top surface of the substrate 100. The first contact region CTR1 maybe provided to have the first width WT1.

At least two of the second ends of the second electrodes EL2 may havethe same horizontal position. For example, the second electrodes EL2 maybe stacked to form a stepwise structure with five steps. The second endsof the second electrodes EL2 may be positioned in the second slope SLP2with respect to the top surface of the substrate 100. The second contactregion CTR2 may be provided to have the second width WT2.

In an exemplary embodiment, the first electrodes EL1 and the secondelectrodes EL2 may be asymmetrically disposed with respect to the cellarray region CAR. For example, the first and second slopes SLP1 and SLP2may be different from each other. For example, the first slope SLP1 maybe smaller than the second slope SLP2. In an exemplary embodiment, thefirst and second widths WT1 and WT2 may be different from each other.For example, the first width WT1 may be greater than the second widthWT2.

At least two of the third ends of the first dummy electrodes DEL1 mayhave the same horizontal position. For example, the third ends of twofirst dummy electrodes DEL1 which are vertically adjacent to each othermay have substantially the same horizontal position. For example, thefirst dummy electrodes DEL1 may be stacked to form a stepwise structurewith five steps. The third ends of the first dummy electrodes DEL1 maybe positioned in the third slope SLP3 with respect to the top surface ofthe substrate 100. The first dummy region DMR1 may be provided to havethe third width WT3.

At least two of the fourth ends of the second dummy electrodes DEL2 mayhave the same horizontal position. For example, the fourth ends of twpsecond dummy electrodes DEL2 which are vertically adjacent to each othermay have substantially the same horizontal position. The second dummyelectrodes DEL2 may be stacked to form a stepwise structure with fivesteps. The second dummy electrodes DEL2 of the second dummy electrodesDEL2 may be positioned in the fourth slope SLP4 with respect to the topsurface of the substrate 100. The second dummy region DMR2 may beprovided to have the fourth width WT4.

In an exemplary embodiment, the first dummy electrodes DEL1 and thesecond dummy electrodes DEL2 may be symmetrically disposed with respectto the cell array region CAR. The third and fourth slopes SLP3 and SLP4may be substantially the same. The third and fourth widths WT3 and WT4may be substantially the same.

In an exemplary embodiment, the first slope SLP1 may be smaller than thethird slope SLP3, and the second slope SLP2 may be substantially thesame as the third and fourth slopes SLP3 and SLP4. The first width WT1may be greater than the third width WT3, and the second width WT2 may besubstantially equal to third and fourth widths WT3 and WT4.

In an exemplary embodiment, as shown in FIGS. 9A, 9B, 10, 11, and 12,the first and second dummy electrodes DEL1 and DEL2 may beasymmetrically disposed with respect to the cell array region CAR. Forexample, the third and fourth slopes SLP3 and SLP4 may be different fromeach other. In an exemplary embodiment, the fourth slope SLP4 may begreater than the third slope SLP3. Also, the third and fourth widths WT3and WT4 may be different from each other. For example, the third widthWT3 may be greater than the fourth width WT4.

In an exemplary embodiment, the contact plugs PLG of the interconnectionstructure may be respectively connected to the first electrodes EL1 ofthe first contact region CTR1. At least two of the second electrodes EL2may be stacked in a vertically aligned manner on the second contactregion CTR2. The interconnection structure need not be formed in thesecond contact region CTR2 to reduce the area of the second electrodesEL2. At least two of the first and second dummy electrodes DEL1 and DEL2may be stacked in a vertically aligned manner on the first and seconddummy regions DMR1 and DMR2. The interconnection structure need not beformed in the first and second dummy regions DMR1 and DMR2 to reduce thearea of the first and second dummy regions DMR1 and DMR2 and to increasethe effective area of the cell array region CAR.

FIGS. 17 through 24 are sectional views illustrating a method offabricating a three-dimensional semiconductor device, according to anexemplary embodiment of the inventive concept. FIGS. 17 through 24 aresectional views taken along I-I′ of FIG. 5A.

Referring to FIG. 17, a buffer insulating layer 105 may be formed on thesubstrate 100, and sacrificial layers 110 and insulating layers 115 maybe alternately formed on the buffer insulating layer 105.

The substrate 100 may include the cell array region CAR and the firstand second contact regions CTR1 and CTR2 and the first and second dummyregions DMR1 and DMR2 surrounding the cell array region CAR. Here, thefirst and second contact regions CTR1 and CTR2 may be provided oppositeto each other, and the first and second dummy regions DMR1 and DMR2 maybe provided opposite to each other.

The sacrificial layers 110 may be formed of a material having etchselectivity with respect to the buffer insulating layer 105 and theinsulating layers 115. For example, the buffer insulating layer 105 andthe insulating layers 115 may be formed of or include silicon oxide, andthe sacrificial layers 110 may be formed of or include silicon nitride.

Referring to FIG. 18, the sacrificial layers 110 and the insulatinglayers 115 on the first and second contact regions CTR1 and CTR2 and thefirst and second dummy regions DMR1 and DMR2 may be patterned to form astepwise structure.

For example, a mask pattern (not shown) may be formed on the uppermostone of the insulating layers 115, and the uppermost layers of theinsulating and sacrificial layers 115 and 110 may be etched using themask pattern as an etch mask to expose the second uppermost layer of theinsulating layers 115. Thereafter, the mask pattern may be etched toreduce a width of the mask pattern, and the second uppermost layers ofthe insulating and sacrificial layers 115 and 110 may be etched usingthe etched mask pattern as an etch mask. The etching process on theinsulating and sacrificial layers 115 and 110 and the etching process onthe mask pattern may be repeatedly performed, and thus, the insulatingand sacrificial layers 115 and 110 may be formed to have a stepwisestructure on the first and second contact regions CTR1 and CTR2 and thefirst and second dummy regions DMR1 and DMR2.

In an exemplary embodiment, various stepwise structures as shown inFIGS. 5A, 9A, and 13A may be formed by controlling positions and areasof the first and second contact regions CTR1 and CTR2 and the first andsecond dummy regions DMR1 and DMR2 covered with the mask pattern.

After the etching process, the mask pattern may be removed, and then, aninsulating gapfill layer 117 may be formed on the substrate 100. Theinsulating gapfill layer 117 may be planarized to expose a top surfaceof the uppermost layer of the insulating layers 115.

Referring to FIG. 19, the insulating layers 115, the sacrificial layers110, and the buffer insulating layer 105 on the cell array region CARmay be patterned to form vertical holes 120 exposing the substrate 100.For example, the vertical holes 120 may be arranged in a zigzag manner,when viewed in a plan view. In an exemplary embodiment, the verticalholes 120 may be arranged in a linear manner, when viewed in a planview.

Thereafter, the vertical structures VS may be formed to fill thevertical holes 120, respectively. The formation of the verticalstructures VS (e.g., shown in FIG. 6B) may include forming the secondsemiconductor pattern SP2 to cover inner side surfaces of the verticalholes 120, forming the first semiconductor pattern SP1 to cover thevertical holes 120 provided with the second semiconductor pattern SP2,and forming conductive pads D (e.g., see FIG. 4) on the first and secondsemiconductor patterns SP1 and SP2. Each of the conductive pads D may bea doped region, which may be formed by an implantation process, or aconductive pattern, which may be formed by a deposition process.Furthermore, the first semiconductor pattern SP1 may be a hollowstructure with a closed bottom.

Referring to FIG. 20, the insulating gapfill layer 117, the insulatinglayers 115, the sacrificial layers 110, and the buffer insulating layer105 may be patterned to form trenches 135 exposing the substrate 100.Side surfaces of the insulating and sacrificial layers 115 and 110 maybe exposed by the trenches 135.

Referring to FIG. 21, the sacrificial layers 110 exposed by the trenches135 may be removed to form recesses 140 between the insulating layers115. The recesses 140 may be connected to the trenches 135. In anexemplary embodiment, the removal of the sacrificial layers 110 may beperformed using an isotropic etching process.

Referring to FIG. 22, a first conductive layer (not shown) may be formedon the substrate 100 to fill the trenches 135 and the recesses 140. Thefirst conductive layer may include a barrier layer (not shown)conformally covering inner surfaces of the trenches 135 and the recesses140 and an electrode layer (not shown) filling remaining spaces of thetrenches 135 and the recesses 140. The first conductive layer may beremoved from the trenches 135, and as a result, the electrodes EL may belocally formed in the recesses 140, respectively.

In an exemplary embodiment, the electrodes EL may be classified intofour types, according to their positions. For example, the electrodes ELmay include the first electrodes EL1, the second electrodes EL2, thefirst dummy electrodes DEL1, and the second dummy electrodes DEL2.

In the case where the vertical structures VS are formed to have astructure shown in FIG. 6B, the vertical pattern VP of the data storinglayer DS may be conformally formed between the second semiconductorpattern SP2 and the stack structures ST.

Thereafter, an ion implantation process may be performed to injectdopants into the substrate 100 exposed by the trenches 135 and therebyto form the common source regions 145. In an exemplary embodiment, thecommon source regions 145 may be formed after the formation of theelectrodes EL. In an exemplary embodiment, the common source regions 145may be formed after the formation of the trenches 135 and before theremoval of the sacrificial layers 110.

The common source structures may be formed in the trenches 135 toprovide current paths for electric connection to the common sourceregions 145. The formation of the common source structures may includeconformally forming an insulating spacer layer (not shown) on sidewallsof the trenches 135, anisotropically etching the insulating spacer layerto form the insulating sidewall spacer SP exposing the common sourceregions 145, forming a second conductive layer to fill the trenches 135provided with the insulating sidewall spacer SP, and then, planarizingthe second conductive layer to form the common source plugs CSPLG.

Referring to FIG. 23, the contact plugs PLG may be formed to penetratethe insulating gapfill layer 117 on at least one of the first and secondcontact regions CTR1 and CTR2. For example, the contact plugs PLG formedon the first contact region CTR1 may be electrically connected to thefirst electrodes EL1. In an exemplary embodiment, the contact plugs PLGmay be formed on the first and second contract regions CTR1 and CTR2,and may be electrically connected to the first and second electrodes EL1and EL2, respectively.

As shown in FIGS. 6A, 7, and 8, the contact plugs PLG may beelectrically connected to the first ends of the first electrodes EL1,respectively. Although not shown, in an exemplary embodiment, thecontact plugs PLG may be electrically connected to the second ends ofthe second electrodes EL2, respectively.

Referring to FIG. 24, a capping insulating layer 175 may be formed onthe substrate 100 to cover the vertical structures VS, the common sourcestructure, the contact plugs PLG, and the insulating gapfill layer 117.

Thereafter, the bit line contact plugs BPLG may be formed to penetratethe capping insulating layer 175. The bit line contact plugs BPLG may beelectrically connected to the vertical structures VS, respectively.Next, the contact patterns CT may be formed to be electrically connectedto the contact plugs PLG, respectively.

The bit line BL may be formed on the capping insulating layer 175 to beelectrically connected to the bit line contact plugs BPLG, and theconnection lines CL may be formed to be electrically connected to thecontact patterns CT.

According to an exemplary embodiment of the inventive concept, in astack structure of vertically-stacked electrodes, a dummy region isprovided to have a reduced area, and thus, the effective area of a cellarray region may increase.

While the present inventive concept has been shown and described withreference to exemplary embodiments thereof, it will be apparent to thoseof ordinary skill in the art that various changes in form and detail maybe made therein without departing from the spirit and scope of theinventive concept as defined by the following claims.

What is claimed is:
 1. A three-dimensional semiconductor device,comprising: a substrate including a cell array region, a dummy region, acontact region, and an overlapped region, the contact region beingadjacent to the cell array region in a first direction, the dummy regionbeing adjacent to the cell array region in a second direction, theoverlapped region being adjacent to the contact region in the seconddirection and adjacent to the dummy region in the first direction, thesecond direction being perpendicular to the first direction; a firststack structure including a plurality of first electrodes verticallystacked on the substrate, the first stack structure extending along thefirst direction on the cell array region and the contact region; asecond stack structure including a plurality of second electrodesvertically stacked on the substrate, the second stack structure beingdisposed on the dummy region and the overlapped region; and an electrodeseparation region extending in the first direction between the firststack structure and the second stack structure, wherein the second stackstructure on the overlap region has a first staircase structureextending in the first direction and a second staircase structureextending in the second direction, the first staircase structure has afirst slope with respect to the top surface of the substrate and thesecond staircase structure has a second slope with respect to the topsurface of the substrate, the second slope is greater than the firstslope, and an uppermost one of the plurality of first electrodes has afirst length in the second direction, an uppermost one of the pluralityof second electrodes has a second length in the second direction, andthe first length is larger than the second length.
 2. Thethree-dimensional semiconductor device of claim 1, wherein the firstlength is greater than twice the second length.
 3. The three-dimensionalsemiconductor device of claim 1, wherein a difference in length in thefirst direction between the uppermost one and a lowermost one of theplurality of second electrodes is greater than a difference in length inthe second direction between the uppermost one and the lowermost one ofthe plurality of second electrodes.
 4. The three-dimensionalsemiconductor device of claim 1, further comprising vertical structurespenetrating the plurality of first electrodes on the cell array regionand a bit line electrically connecting at least one of the verticalstructures, wherein the plurality of second electrodes are electricallyseparated from the bit line.
 5. The three-dimensional semiconductordevice of claim 1, further comprising an insulating pattern at leastpartially filling the electrode separation region, wherein a top of theinsulating pattern is located at a vertical level higher than a topsurface of the uppermost one of the plurality of second electrodes.
 6. Athree-dimensional semiconductor device, comprising: a substrateincluding a cell array region, a contact region, and a dummy region, thecontact region being adjacent to the cell array region in a firstdirection, the dummy region being adjacent to the cell array region in asecond direction, the second direction being perpendicular to the firstdirection; a first stack structure including a plurality of firstelectrodes vertically stacked on the substrate, the first stackstructure extending along the first direction on the cell array regionand the contact region; a second stack structure including a pluralityof second electrodes vertically stacked on the substrate, the secondstack structure being disposed on the dummy region; and an electrodeseparation region extending in the first direction between the firststack structure and the second stack structure, wherein an uppermost oneof the plurality of first electrodes has a first length in the seconddirection, an uppermost one of the plurality of second electrodes has asecond length in the second direction, and the first length is largerthan the second length.
 7. The three-dimensional semiconductor device ofclaim 6, wherein the first length is greater than twice the secondlength.
 8. The three-dimensional semiconductor device of claim 6,wherein a difference in length in the first direction between theuppermost one and a lowermost one of the plurality of second electrodesis greater than a difference in length in the second direction betweenthe uppermost one and the lowermost one of the plurality of secondelectrodes.
 9. The three-dimensional semiconductor device of claim 6,further comprising vertical structures penetrating the plurality offirst electrodes on the cell array region and a bit line electricallyconnecting at least one of the vertical structures, wherein theplurality of second electrodes are electrically separated from the bitline.
 10. The three-dimensional semiconductor device of claim 6, whereinthe second stack structure has a first sidewall adjacent to theelectrode separation region and a second sidewall facing the firstsidewall in the second direction, and wherein the first sidewall isinclined at a first angle relative to a direction perpendicular to a topsurface of the substrate, the second sidewall is inclined at a secondangle greater than the first angle with respect to a directionperpendicular to the top surface of the substrate.
 11. Thethree-dimensional semiconductor device of claim 10, wherein the secondstack structure has a third sidewall adjacent to the first sidewall andthe second sidewall, and wherein the third sidewall is inclined at athird angle greater than the second angle with respect to a directionperpendicular to the top surface of the substrate.
 12. Thethree-dimensional semiconductor device of claim 6, further including anoverlapped region, the overlapped region being adjacent to the contactregion in the second direction and adjacent to the dummy region in thefirst direction, wherein at least a portion of the second stack isdisposed on the overlapped region.
 13. The three-dimensionalsemiconductor device of claim 6, further comprising an insulatingpattern at least partially filling the electrode separation region,wherein a top of the insulating pattern is located at a vertical levelhigher than a top surface of the uppermost one of the plurality ofsecond electrodes.
 14. A three-dimensional semiconductor device,comprising: a substrate including a cell array region, a contact region,a dummy region and a overlapped region, the contact region beingadjacent to the cell array region in a first direction, the dummy regionbeing adjacent to the cell array region in a second direction, theoverlapped region being adjacent to the contact region in the seconddirection and adjacent to the dummy region in the first direction, thesecond direction being perpendicular to the first direction; a firststack structure including a plurality of first electrodes verticallystacked on the substrate, the first stack structure extending along thefirst direction on the cell array region and the contact region; asecond stack structure including a plurality of second electrodesvertically stacked on the substrate, the second stack structure beingdisposed on the dummy region and overlapped region; a third stackstructure disposed between the first stack structure and the secondstack structure and extending in the first direction; a first electrodeseparation region extending in the first direction between the firststack structure and the third stack structure; a second electrodeseparation region extending in the first direction between the secondstack structure and the third stack structure; and first verticalstructures penetrating the first stack structure on the cell arrayregion, wherein a lowermost one of the plurality of second electrodeshas a first sidewall on the dummy region and a second sidewallperpendicular to the first sidewall on the overlapped region, andwherein a distance in the second direction between the verticalstructures and the first sidewall is smaller than a distance in a firstdirection between the vertical structures and the second sidewall. 15.The three-dimensional semiconductor device of claim 14, furthercomprising second vertical structures penetrating the third stackstructure, and a bit line electrically connecting at least one of thefirst vertical structures and at least one of the second verticalstructures.
 16. The three-dimensional semiconductor device of claim 15,wherein at least a portion of the bit line is located on the secondstacked structure, wherein the plurality of second electrodes areelectrically separated from the bit line.
 17. The three-dimensionalsemiconductor device of claim 14, wherein an uppermost one of theplurality of first electrodes has a first length in the seconddirection, an uppermost one of the plurality of second electrodes has asecond length in the second direction, and the first length is largerthan the second length.
 18. The three-dimensional semiconductor deviceof claim 17, wherein the first length is greater than twice the secondlength.
 19. The three-dimensional semiconductor device of claim 14,wherein the second stack structure has a first sidewall adjacent to theelectrode separation region and a second sidewall facing the firstsidewall in the second direction, and wherein the first sidewall isinclined at a first angle relative to a direction perpendicular to a topsurface of the substrate, the second sidewall is inclined at a secondangle greater than the first angle with respect to a directionperpendicular to the top surface of the substrate.
 20. Thethree-dimensional semiconductor device of claim 14, wherein the secondstack structure has a third sidewall adjacent to the first sidewall andthe second sidewall in the overlapped region, and wherein the thirdsidewall is inclined at a third angle greater than the second angle withrespect to a direction perpendicular to the top surface of thesubstrate.